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半导体产业报告
光掩膜概要(报告)
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出自:SEMI

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张优红(86.21.60278579, czhang@semi.org

半导体光掩膜市场趋势/预测

2008年全球光掩膜市场达到29亿美元,预计2011年会达到27亿美元。

SEMI已经整理了一份全面的光掩膜市场摘要,涉及了全球7个地区,包括北美、日本、欧洲、台湾、韩国、中国大陆及其他地区,反映出整个市场规模,同时还包括了各家公司的财务报告等信息。

Source: SEMI Photomask Characterization Summary, March 2009

内容
• 方法论及范围
• 背景
• 技术趋势
• 45-nm及更小节点
• 市场趋势
• 市场展望
• 总结

附录
• 光掩膜及掩膜版问卷
• 光掩膜供应商网站
• 图1—2008年硅片制造材料市场
• 图2—1986年以来光掩膜市场合并情况
• 图3—光掩膜行业市场份额趋势
• 图4—硅片fab产能(按特征尺寸)
• 图5—光刻技术关键特性(按产品分类)
• 图6—光掩膜市场预测(millions of U.S. dollars)
• 表1—光掩膜供应商列表
• 表2-- DRAM M11/2 Pitch (nm)工艺趋势
• 表3--32-nm光刻技术发展及时间点
• 表4—光掩膜供应商策略关系概要
• 表5—地区光掩膜市场2003-2011

价格信息
  多用户
SEMI会员 $1,250
非会员 $2,250

Photomask Characterization Summary (Report)

Market Trends/Forecast for the Semiconductor Photomask Market

The worldwide photomask market is estimated to be $2.90 billion in 2008 and forecasted to reach $2.7 billion in 2011.

SEMI has conducted a supply-side market characterization of the photomask market. Seven region of the world are covered in this summary including North America, Japan, Europe, Taiwan, Korea, China, and Rest of World. Market size estimates reflect the merchant and captive market, and excludes license, royalty, and equipment revenues. In addition to the interviews, a comprehensive literature review, including company financial reports, was conducted.

Source: SEMI Photomask Characterization Summary, March 2009

Table of Contents
• Methodology and Scope
• Background
• Technology Trends
• Beyond 45-nm
• Market Trends
• Market and Market Outlook
• Summary

Appendices
• Photomasks and Reticle questionnaire
• Summary of Merchant Photomask Supplier Websites
• Figure 1 – 2008 Wafer Fabrication Materials Market
• Figure 2 – Consolidation in the Photomask Industry Since 1986
• Figure 3 – Marketshare Tends in the Photomask Industry
• Figure 4 – Wafer Fab Capacity by Feature Size
• Figure 5 – Key Lithography-related Characteristics by Product
• Figure 6 – Photomask Market Forecast (millions of U.S. dollars)
• Table 1 – List of Photomask Suppliers Contacted for the Photomask Characterization
• Table 2 – DRAM M11/2 Pitch (nm) Technology Trend Targets
• Table 3 – 32-nm Lithography Technology Adoption and Timing
• Table 4 – Summary of Photomask Suppliers Strategic Relationships
• Table 5 – Regional Photomask market 2003-2011

Pricing Information
  Multi User
SEMI Member $1,250
Non-member  $2,250

 

 

 

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文章收入时间: 2009-12-08
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